{"title":"金属与光学互连技术的比较分析","authors":"D. Jiang, B. Bhuva, D. Kerns, S. Kerns","doi":"10.1109/IITC.2000.854270","DOIUrl":null,"url":null,"abstract":"Barriers to industrial implementation of optical interconnects on an IC center on the balance between power requirements and speed improvements over existing metal interconnect systems. This paper focuses on such comparison based on empirically measured quantum efficiency and circuit-level projections. Multiple forms of clock distribution schemes are analyzed to show that the power requirements for optical interconnect are comparable to those of conventional metal interconnects. Implementing optical technology on long interconnect lines will improve the speed performance of ICs. The availability of such a method will allow design engineers to guide the partitioning of optical and conventional interconnects within ICs.","PeriodicalId":287825,"journal":{"name":"Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407)","volume":"244 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"13","resultStr":"{\"title\":\"Comparative analysis of metal and optical interconnect technology\",\"authors\":\"D. Jiang, B. Bhuva, D. Kerns, S. Kerns\",\"doi\":\"10.1109/IITC.2000.854270\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Barriers to industrial implementation of optical interconnects on an IC center on the balance between power requirements and speed improvements over existing metal interconnect systems. This paper focuses on such comparison based on empirically measured quantum efficiency and circuit-level projections. Multiple forms of clock distribution schemes are analyzed to show that the power requirements for optical interconnect are comparable to those of conventional metal interconnects. Implementing optical technology on long interconnect lines will improve the speed performance of ICs. The availability of such a method will allow design engineers to guide the partitioning of optical and conventional interconnects within ICs.\",\"PeriodicalId\":287825,\"journal\":{\"name\":\"Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407)\",\"volume\":\"244 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-06-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"13\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IITC.2000.854270\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IITC.2000.854270","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Comparative analysis of metal and optical interconnect technology
Barriers to industrial implementation of optical interconnects on an IC center on the balance between power requirements and speed improvements over existing metal interconnect systems. This paper focuses on such comparison based on empirically measured quantum efficiency and circuit-level projections. Multiple forms of clock distribution schemes are analyzed to show that the power requirements for optical interconnect are comparable to those of conventional metal interconnects. Implementing optical technology on long interconnect lines will improve the speed performance of ICs. The availability of such a method will allow design engineers to guide the partitioning of optical and conventional interconnects within ICs.