{"title":"灵活的阈值电压4端finfet","authors":"Yongxun Liu, M. Masahara, K. Ishii, E. Suzuki","doi":"10.1109/ICICDT.2004.1309915","DOIUrl":null,"url":null,"abstract":"Four-terminal (4T) FinFETs with independent double gates and an ideal rectangular cross-section Si-fin channel have successfully been fabricated by using newly developed orientation-dependent wet etching. The flexible threshold voltage (V/sub th/) controllability by one of the double gates arid by synchronized driving mode operation is systematically examined for the fabricated 4T-FinFFTs with different silicon (Si)-fin thicknesses (T/sub Si/'s). The experimental results reveal that the thinner T/sub Si/ is effective to accomplish a flexible V/sub th/ tuning. The developed processes are very attractive to the fabrication of the advanced 4T-FinFETs for flexible function VLSI circuits.","PeriodicalId":158994,"journal":{"name":"2004 International Conference on Integrated Circuit Design and Technology (IEEE Cat. No.04EX866)","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-10-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Flexible threshold voltage 4-terminal FinFETs\",\"authors\":\"Yongxun Liu, M. Masahara, K. Ishii, E. Suzuki\",\"doi\":\"10.1109/ICICDT.2004.1309915\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Four-terminal (4T) FinFETs with independent double gates and an ideal rectangular cross-section Si-fin channel have successfully been fabricated by using newly developed orientation-dependent wet etching. The flexible threshold voltage (V/sub th/) controllability by one of the double gates arid by synchronized driving mode operation is systematically examined for the fabricated 4T-FinFFTs with different silicon (Si)-fin thicknesses (T/sub Si/'s). The experimental results reveal that the thinner T/sub Si/ is effective to accomplish a flexible V/sub th/ tuning. The developed processes are very attractive to the fabrication of the advanced 4T-FinFETs for flexible function VLSI circuits.\",\"PeriodicalId\":158994,\"journal\":{\"name\":\"2004 International Conference on Integrated Circuit Design and Technology (IEEE Cat. No.04EX866)\",\"volume\":\"22 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-10-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2004 International Conference on Integrated Circuit Design and Technology (IEEE Cat. No.04EX866)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICICDT.2004.1309915\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2004 International Conference on Integrated Circuit Design and Technology (IEEE Cat. No.04EX866)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICICDT.2004.1309915","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Four-terminal (4T) FinFETs with independent double gates and an ideal rectangular cross-section Si-fin channel have successfully been fabricated by using newly developed orientation-dependent wet etching. The flexible threshold voltage (V/sub th/) controllability by one of the double gates arid by synchronized driving mode operation is systematically examined for the fabricated 4T-FinFFTs with different silicon (Si)-fin thicknesses (T/sub Si/'s). The experimental results reveal that the thinner T/sub Si/ is effective to accomplish a flexible V/sub th/ tuning. The developed processes are very attractive to the fabrication of the advanced 4T-FinFETs for flexible function VLSI circuits.