灵活的阈值电压4端finfet

Yongxun Liu, M. Masahara, K. Ishii, E. Suzuki
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引用次数: 1

摘要

采用新发展的定向相关湿法蚀刻技术,成功地制备了具有独立双栅极和理想矩形截面Si-fin沟道的四端finfet。系统研究了不同硅(Si)鳍片厚度(T/sub Si/ s)的4t - finfft双栅极和同步驱动模式对柔性阈值电压(V/sub /s)的可控性。实验结果表明,较薄的T/sub Si/可以有效地实现柔性的V/sub /调谐。所开发的工艺对于用于柔性功能VLSI电路的先进4t - finfet的制造具有很大的吸引力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Flexible threshold voltage 4-terminal FinFETs
Four-terminal (4T) FinFETs with independent double gates and an ideal rectangular cross-section Si-fin channel have successfully been fabricated by using newly developed orientation-dependent wet etching. The flexible threshold voltage (V/sub th/) controllability by one of the double gates arid by synchronized driving mode operation is systematically examined for the fabricated 4T-FinFFTs with different silicon (Si)-fin thicknesses (T/sub Si/'s). The experimental results reveal that the thinner T/sub Si/ is effective to accomplish a flexible V/sub th/ tuning. The developed processes are very attractive to the fabrication of the advanced 4T-FinFETs for flexible function VLSI circuits.
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