基于局部深能级瞬态光谱的MOS界面阱分布定量成像

N. Chinone, Yasuo Cho
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引用次数: 0

摘要

研究了局部深能级瞬态光谱在直流偏压作用下的作用。结果表明,local- dts检测到的物理源主要是界面trap。此外,还证明了界面陷阱随时间常数的二维(2D)定量剖面。通过对不同时间常数图像的对比发现,不同时间常数的界面陷阱横向分布不同,表明界面陷阱的二维分布取决于其能级。这些结果表明,局部- dltsi是研究界面陷阱的微观方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Quantitative Imaging of MOS Interface Trap Distribution by Using Local Deep Level Transient Spectroscopy
The local deep level transient spectroscopy, which measures traps with high lateral resolution using sharp tip, was investigated as functions of DC bias. The results showed that the physical origin which was detected by local-DLTS was mainly interface trap. Furthermore, two-dimensional (2D) quantitative profiling of interface traps as a function of time constant was demonstrated. Comparison between images of different time constant revealed that interface traps with different time constant had different lateral distribution, which suggests that 2D distribution of interface traps depends on their energy level. These results show that local-DLTsis promising for microscopic investigation of interface traps.
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