考虑尺寸和几何关系的Ge纳米线无结非场效应管迁移率计算

Hung-Yu Ye, Chia-Che Chung, I-Hsieh Wong, H. Lan, C. Liu
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引用次数: 1

摘要

通过理论计算,研究了Ge纳米线非场效应管中通道截面几何形状和电子迁移率与尺寸的关系。在高过载电压(>0.5V)下工作的宽通道(宽度>7nm)具有最高的迁移率。而菱形通道在低过载电压(<0.3V)和窄通道(宽度<7nm)下具有最高的迁移率。这主要是由于不同通道条件下的表面粗糙度散射不同。我们的计算框架基于玻尔兹曼输运,并通过从无结纳米线nFET器件的实验数据中提取的电子迁移率进行了验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mobility calculation of Ge nanowire junctionless NFETs with size and geometry dependence
The channel cross section geometry and size dependence of the electron mobility in Ge nanowire nFETs is studied by theoretical calculations for devices beyond the 7nm node. circular channels have the highest mobility for wide channels (width>7nm) operating at high overdrive voltage (>0.5V). While diamond-shaped channels have the highest mobility for wide channels operating at low overdrive voltage (<0.3V) and narrow channels (width<7nm). This is attributed mainly to the different surface roughness scattering at different channel conditions. Our calculation framework is based on Boltzmann transport and has been verified with the electron mobility extracted from the experimental data of junctionless nanowire nFET devices.
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