{"title":"金刚石薄膜的精细图案","authors":"M. Mao, T. P. Wang, Jin Xie, W. Y. Wang","doi":"10.1109/MEMSYS.1995.472565","DOIUrl":null,"url":null,"abstract":"Due to its unique properties (high nicchanical strength, low friction coeficicnt, high wear rcsistance and cheniical incrtncss), diamond is an esccllcnt candidate matcrial for micromechanical application. One of the important considerations in the fabrication of diamond MERlS is fine patterning. Direct patterning of diamond is difficult due to its extreme resistance to chemical attack. An alternative approach is to grow a prepattemcd film through selective nucleation. However, nucleation selectivity (<IO5) reported in previous were not high enough to realize patterning in mixon scale. The authors have developed a i x w l sc!ccti\\a dcposition method in which a high sclectivity (5x lo6) was achieved and perfcct diamond patterns with narrowest width I . 8 p i were obtained at the first tinic[\"I. ~n tlie present paper, we rcport tlie rcccnt dcvclopmcnt in the fabrication of diamond micromotor structure bascd on this patterning proccss as well as boron-doping technique.","PeriodicalId":273283,"journal":{"name":"Proceedings IEEE Micro Electro Mechanical Systems. 1995","volume":"13 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-01-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"The fine patterning of diamond thin film\",\"authors\":\"M. Mao, T. P. Wang, Jin Xie, W. Y. Wang\",\"doi\":\"10.1109/MEMSYS.1995.472565\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Due to its unique properties (high nicchanical strength, low friction coeficicnt, high wear rcsistance and cheniical incrtncss), diamond is an esccllcnt candidate matcrial for micromechanical application. One of the important considerations in the fabrication of diamond MERlS is fine patterning. Direct patterning of diamond is difficult due to its extreme resistance to chemical attack. An alternative approach is to grow a prepattemcd film through selective nucleation. However, nucleation selectivity (<IO5) reported in previous were not high enough to realize patterning in mixon scale. The authors have developed a i x w l sc!ccti\\\\a dcposition method in which a high sclectivity (5x lo6) was achieved and perfcct diamond patterns with narrowest width I . 8 p i were obtained at the first tinic[\\\"I. ~n tlie present paper, we rcport tlie rcccnt dcvclopmcnt in the fabrication of diamond micromotor structure bascd on this patterning proccss as well as boron-doping technique.\",\"PeriodicalId\":273283,\"journal\":{\"name\":\"Proceedings IEEE Micro Electro Mechanical Systems. 1995\",\"volume\":\"13 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-01-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings IEEE Micro Electro Mechanical Systems. 1995\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MEMSYS.1995.472565\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings IEEE Micro Electro Mechanical Systems. 1995","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MEMSYS.1995.472565","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Due to its unique properties (high nicchanical strength, low friction coeficicnt, high wear rcsistance and cheniical incrtncss), diamond is an esccllcnt candidate matcrial for micromechanical application. One of the important considerations in the fabrication of diamond MERlS is fine patterning. Direct patterning of diamond is difficult due to its extreme resistance to chemical attack. An alternative approach is to grow a prepattemcd film through selective nucleation. However, nucleation selectivity (
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