累积模式p沟道SOI mosfet的亚阈值斜率

J. Colinge, F. van de Wiele, D. Flandre
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引用次数: 1

摘要

对于增强型mosfet的阈下斜率,已经有了一个很好的模型。实际上,亚阈值斜率由S=kT/q ln10 (1+/spl alpha/)给出,其中/spl alpha/等于比值C/ bb//C/ ox1/。换句话说,/spl alpha/是通道下方结构的电容与通道上方结构的电容之比。C/sub bb/分别等于C/sub depl/、C/sub si/和(C/sub si/与C/sub ox2/串联)、全耗尽(FD) SOI与后积累和全耗尽SOI器件。由于累积模式(AM) p通道SOI MOSFET在亚阈值区域的电位分布与n通道FD增强模式(FDEM)器件的电位分布相似,因此可以使用相同的分析模型来确定s >
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Subthreshold slope of accumulation-mode p-channel SOI MOSFETs
There exists a well established model for the subthreshold slope of enhancement-mode MOSFETs. Indeed, the subthreshold slope is given by: S=kT/q ln10 (1+/spl alpha/) where /spl alpha/ is equal to the ratio C/sub bb//C/sub ox1/. In other words, /spl alpha/ is the ratio between the capacitance of the structure below the channel and that of the structure above it. C/sub bb/ is equal to C/sub depl/, C/sub si/ and (C/sub si/ in series with C/sub ox2/) in bulk, fully depleted (FD) SOI with back accumulation and fully depleted SOI devices, respectively. As the potential distribution in an accumulation-mode (AM) p-channel SOI MOSFET in the subthreshold regime is similar to that of an n-channel FD enhancement-mode (FDEM) device, the same analytical model can be used to determine S.<>
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