双栅MOS晶闸管的实验演示

N. Iwamuro, Y. Hoshi, T. Iwaana, K. Ueno, Y. Seki, M. Otsuki, K. Sakurai
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引用次数: 12

摘要

提出了一种新的器件概念,即双栅MOS晶闸管(DGMOS),可以同时获得晶闸管的低导通压降和IGBT的快速关断速度,并首次报道了在具有900 V正向阻断能力的器件上进行的测量结果。其导通电压降(Von)为1.30V,电流为12 a (71.4 a /cm/sup 2/),关断损耗(Eoff)为114 /spl mu/J。与电压谐振电路中的IGBT相比,这些Von, Eoff值表明具有更优越的权衡特性。此外,通过减少栅多晶硅层的片电阻和增加从晶闸管模式工作到IGBT模式的过渡时间,发现在关断阶段均匀的电流分布改善了DGMOS的关断能力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Experimental demonstration of dual gate MOS thyristor
A new device concept, called the dual gate MOS thyristor (DGMOS), is introduced for simultaneously obtaining the low on-state voltage drop of a thyristor together with the fast turn-off speed of an IGBT and the results of measurement performed on devices with 900 V forward blocking capability are reported for the first time. Its on-state voltage drop (Von) was 1.30V at a current of 12 A (71.4 A/cm/sup 2/) with a turnoff loss (Eoff) of 114 /spl mu/J. These values of Von, Eoff indicate a much superior trade-off characteristic when compared to the IGBT in the voltage resonant circuit. Furthermore, the ability to turn-off the DGMOS is found to be improved by a homogeneous current distribution at the turn-off stage via reducing a sheet resistance of the gate poly-crystalline silicon layer and increasing a transition time from the thyristor mode operation to the IGBT mode.
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