亚微米MOS器件的面内和面外介电常数测量技术

Chua Chee Tee, G. Sarkar, S.C.Y. Meng, D. Yu, L. Chan
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摘要

本文重点介绍了用于面内和面外测量的低k SOG(玻璃上自旋)介电常数的仔细表征技术。在面外介电常数测量的情况下,使用电容-电压(C-V)扫描来测量SOG电容。平面内介电常数测量需要内置电容,提出了一种提取耦合电容的新方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
In-plane and out-of-plane dielectric constant measurement techniques for sub-micron MOS devices
This paper focuses on the techniques adopted to carefully characterize the dielectric constant of low k SOG (spin-on-glass), both for in-plane and out-of-plane measurements. In the case of out-of-plane dielectric constant measurement, the capacitance-voltage (C-V) sweep is utilised to measure the SOG capacitance. For in-plane dielectric constant measurement, intra capacitors are required and a novel technique of extracting coupling capacitance is presented.
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