顺应电流对hfo2基ReRAM器件电铸过程的影响

S. Guitarra, L. Trojman, L. Raymond
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引用次数: 0

摘要

电铸是ReRAM器件的激活过程,通过在氧化膜中创建丝状传导通路来启动电阻开关响应。该步骤是器件正常运行的基础,它由符合电流(Ic)控制,防止reram的硬介电击穿。在本工作中,我们研究了该电流在不同区域的hfo2基ReRAM器件电铸过程和运行中的影响。从IV曲线中提取并分析了一些参数,以了解该工艺如何影响设备的性能。我们发现形成独立于面积器件的CF所需的Ic最大值不会引起电气行为的显着变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effects of the compliance current in the electroforming process of HfO2-based ReRAM devices
Electroforming is the activation process of ReRAM devices that initiates the resistive switching response by creating filamentary conduction paths in the oxide film. This step is fundamental for the proper operation of the device, and it is controlled by a compliance current (Ic) that prevents the hard dielectric breakdown of the ReRAMs. In this work, we study the influence of this current during the electroforming process and operation in HfO2-based ReRAM devices of different areas. Some parameters from the IV curve were extracted and analyzed to understand how the process could affect the device’s performance. We found a maximum value of Ic needed to form the CF independent of the area device that does not provoke significant changes in the electrical behavior.
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