一种优化未来dram冗余设计的缺陷状况预测技术

K. Sakurai, Y. Shimada, K. Yamanishi
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引用次数: 1

摘要

本文介绍了一种预测未来相同或相似生产线生产的DRAM缺陷情况的方法,对0.35微米DRAM的字线缺陷情况的估计与实际数据基本一致。通过实际0.5微米DRAM字线缺陷数据的计算,我们将粒子存在概率密度对粒子直径x的函数D(x)近似为1/x/sup 1.5/的比例。用近似的D(x)和P/sub k/(x)的乘积来估计0.35微米DRAM的字线缺陷计数,P/sub k/(x)是k线短路或开路的可能性函数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A defect-situation forecasting technology to optimize future DRAM-redundancy design
A method of forecasting defect situations in future DRAMs manufactured in the same or similar lines is demonstrated The estimated word-line defect situation of a 0.35 micron DRAM almost agreed with the actual data. By calculation with actual 0.5 micron DRAM word-line defect data, we approximated D(x), the function of particle-existing-probability density on a particle diameter x, as a proportion of 1/x/sup 1.5/. The word-line defect counts of a 0.35 micron DRAM were estimated by the product of the approximated D(x) and P/sub k/(x), the possibility function that k-lines of short or open circuits will be made.
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