{"title":"一种优化未来dram冗余设计的缺陷状况预测技术","authors":"K. Sakurai, Y. Shimada, K. Yamanishi","doi":"10.1109/ISSM.1997.664589","DOIUrl":null,"url":null,"abstract":"A method of forecasting defect situations in future DRAMs manufactured in the same or similar lines is demonstrated The estimated word-line defect situation of a 0.35 micron DRAM almost agreed with the actual data. By calculation with actual 0.5 micron DRAM word-line defect data, we approximated D(x), the function of particle-existing-probability density on a particle diameter x, as a proportion of 1/x/sup 1.5/. The word-line defect counts of a 0.35 micron DRAM were estimated by the product of the approximated D(x) and P/sub k/(x), the possibility function that k-lines of short or open circuits will be made.","PeriodicalId":138267,"journal":{"name":"1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-10-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"A defect-situation forecasting technology to optimize future DRAM-redundancy design\",\"authors\":\"K. Sakurai, Y. Shimada, K. Yamanishi\",\"doi\":\"10.1109/ISSM.1997.664589\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A method of forecasting defect situations in future DRAMs manufactured in the same or similar lines is demonstrated The estimated word-line defect situation of a 0.35 micron DRAM almost agreed with the actual data. By calculation with actual 0.5 micron DRAM word-line defect data, we approximated D(x), the function of particle-existing-probability density on a particle diameter x, as a proportion of 1/x/sup 1.5/. The word-line defect counts of a 0.35 micron DRAM were estimated by the product of the approximated D(x) and P/sub k/(x), the possibility function that k-lines of short or open circuits will be made.\",\"PeriodicalId\":138267,\"journal\":{\"name\":\"1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023)\",\"volume\":\"11 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-10-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM.1997.664589\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.1997.664589","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A defect-situation forecasting technology to optimize future DRAM-redundancy design
A method of forecasting defect situations in future DRAMs manufactured in the same or similar lines is demonstrated The estimated word-line defect situation of a 0.35 micron DRAM almost agreed with the actual data. By calculation with actual 0.5 micron DRAM word-line defect data, we approximated D(x), the function of particle-existing-probability density on a particle diameter x, as a proportion of 1/x/sup 1.5/. The word-line defect counts of a 0.35 micron DRAM were estimated by the product of the approximated D(x) and P/sub k/(x), the possibility function that k-lines of short or open circuits will be made.