细丝RRAM程序后不稳定性的定量模型

R. Degraeve, A. Fantini, G. Gorine, P. Roussel, S. Clima, C. Y. Chen, B. Govoreanu, L. Goux, D. Linten, M. Jurczak, A. Thean
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引用次数: 10

摘要

本文在沙漏模型的背景下讨论并模拟了丝状hf基RRAM器件中观察到的程序不稳定性。结果表明,可以区分两种变化源:(i)细丝收缩中空位数量的变化和(ii)收缩形状的变化。形状变化在时间上不稳定,在每个编程脉冲后表现出对数(时间)依赖的松弛行为。这使得旨在扩大电阻窗口的程序/验证方案非常无效。我们利用QPC传导模型的形状参数的自相关阶跃过程对不稳定性进行了定量的数学描述。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Quantitative model for post-program instabilities in filamentary RRAM
This paper discusses and models the program instability observed in filamentary Hf-based RRAM devices in the context of the Hourglass model. It is demonstrated that two variability sources can be distinguished: (i) number variations of the amount of vacancies in the filament constriction and (ii) constriction shape variations. The shape variations are not stable in time and show a log(time)-dependent relaxation behavior after each programming pulse. This makes program/verify schemes, aiming at widening the resistive window, highly ineffective. We develop a quantitative, mathematical description of the instability using an auto-correlated step process of the shape parameters of the QPC conduction model.
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