用紫外云纹干涉法评价电子封装的热变形行为

Jin-Hyoung Park, Soon-Bok Lee
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引用次数: 2

摘要

近年来,云纹干涉法在电子工业中得到了广泛的应用,用于测量微电子器件中温度变化引起的热应变。倒装芯片封装的尺寸越来越小。为了测量这些小型倒装芯片的热变形,需要更高分辨率的仪器。许多研究者已经尝试用相移法来提高云纹干涉测量的分辨率。但是相移法有物理上的局限性。从根本上说,要获得更高的分辨率,必须改变激光光源。本文利用紫外激光(/spl λ /=325nm)构建了一个云纹干涉测量系统。该紫外系统实现了比He-Ne (/spl lambda/=633nm)系统更高的分辨率。并将该系统应用于倒装封装的热变形评估。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Evaluation of thermal deformation behavior in electronic package using UV moire interferometry
In recent years, moire interferometry method has been used extensively in the electronics industry to determine thermal strains caused by temperature changes in microelectronics devices. The size of a flip-chip package has getting smaller. To measure thermal deformations of these small flip-chips, instruments with much higher resolution are required. Many researchers have tried to achieve this resolution enhancement of moire interferometry by using a phase-shifting method. But the phase-shifting method has physical limitations. Fundamentally to get higher resolution, the laser source should be changed. In this article, we constructed a moire interferometry system by utilizing an ultraviolet laser (/spl lambda/=325nm). This UV system realizes higher resolution than He-Ne (/spl lambda/=633nm) system. And we apply this system to evaluate thermal deformation in flip-chip package.
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