脆性基材开裂分析

L. E. Khoong, T. K. Gan, C. Poh
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引用次数: 1

摘要

研究了含膜片的硅基脆片的开裂问题。采用光学显微镜、红外显微镜和扫描电镜对断口形貌进行了分析。对衬底进行了应力分析,以了解硅薄膜在均匀压力下的变形。为了进一步了解衬底的裂纹扩展行为,对硅材料进行了力学测试。在实验和理论分析的基础上,提出并讨论了其失效机理。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of cracking in brittle substrate
Cracking of a brittle substrate, which is a silicon substrate containing a diaphragm, was studied. Fracture patterns and surfaces were analyzed using optical microscope, infrared microscope and scanning electron microscope. Stress analysis of the substrate was carried out to understand the deformation of the silicon diaphragm as it is subjected to uniform pressure. Mechanical testing of the silicon material was conducted to further understand the crack propagation behavior of the substrate. A failure mechanism was proposed and discussed based on the experimental and theoretical analyses.
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