热载流子退化的横向DMOS晶体管电容和可靠性问题

N. Hefyene, C. Anghel, Renaud Gillon, Zeee, Adrian M. Ionescu, Member, '. Swiss
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引用次数: 11

摘要

本文报道了热载流子对高压DMOS晶体管电容的影响及其与直流特性退化的相关性的实验评估。选择两种应力条件:(i)应力a:在最大漏极电压(接近击穿)和提供最大体电流的栅极电压下,i /sub Bmax/和;(ii)应力- b:在最大漏极和栅极电压下,这与器件可靠性最相关。提出的研究在实验上区分了漂移区降解(应力a)和源端附近栅氧化物降解(应力b)。在应力- b的情况下,虽然传统的直流应力影响评估表明直流参数发生了显著变化,但DMOS的交流特性似乎发生了很大变化。这表明系统实验评估热载子降解对交流特性的影响及其与直流降解的相关性对于解释降解机制的重要性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Hot carrier degradation of lateral DMOS transistor capacitance and reliability issues
This paper reports on an experimental evaluation of the hot-carrier impact on capacitances of high voltage DMOS transistors and their correlation with the degradation of DC characteristics. Two stress conditions were selected: (i) stress-A: at maximum drain voltage (near breakdown) and a gate voltage providing maximum body-current, I/sub Bmax/, and; (ii) stress-B: at maximum drain and gate voltages, which are the most relevant for device reliability. The proposed investigations experimentally distinguish among drift-region degradation, for stress-A, and gate oxide degradation near the source-end, for stress-B. In the case of stress-B, while traditional DC evaluation of stress impact suggests a significant shift in the DC parameters, the DMOS AC characteristics appear considerably altered. This suggests the importance of the systematic experimental evaluation of the impact of hot-carrier degradation of AC characteristics and its correlation with DC degradation in order to explain the degradation mechanisms.
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