W. Rudge, C. Dinkins, W. Boesch, D. Vail, Joshua P. Bruckmeyer, G. Swift
{"title":"使用掩蔽和PEM成像技术的SEL位点定位:Xilinx 28nm 7系列fpga的案例研究","authors":"W. Rudge, C. Dinkins, W. Boesch, D. Vail, Joshua P. Bruckmeyer, G. Swift","doi":"10.1109/NSREC.2016.7891736","DOIUrl":null,"url":null,"abstract":"An unusual methodology for localizing sparse SEL-susceptible sites was successfully used to isolate the die region and identify the sensitive subcircuit responsible for a low cross-section, low-current latchup susceptibility in Xilinx 28nm 7-Series FPGAs. Die masking and photoemission electron microscopy (PEM) imaging contributed to the identification of the circuitry responsible for the latchup susceptibility in 7-Series devices. These results point to a possible approach for using selected devices from this family in high reliability space applications.","PeriodicalId":135325,"journal":{"name":"2016 IEEE Radiation Effects Data Workshop (REDW)","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"SEL Site Localization Using Masking and PEM Imaging Techniques: A Case Study on Xilinx 28nm 7-Series FPGAs\",\"authors\":\"W. Rudge, C. Dinkins, W. Boesch, D. Vail, Joshua P. Bruckmeyer, G. Swift\",\"doi\":\"10.1109/NSREC.2016.7891736\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An unusual methodology for localizing sparse SEL-susceptible sites was successfully used to isolate the die region and identify the sensitive subcircuit responsible for a low cross-section, low-current latchup susceptibility in Xilinx 28nm 7-Series FPGAs. Die masking and photoemission electron microscopy (PEM) imaging contributed to the identification of the circuitry responsible for the latchup susceptibility in 7-Series devices. These results point to a possible approach for using selected devices from this family in high reliability space applications.\",\"PeriodicalId\":135325,\"journal\":{\"name\":\"2016 IEEE Radiation Effects Data Workshop (REDW)\",\"volume\":\"22 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE Radiation Effects Data Workshop (REDW)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/NSREC.2016.7891736\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE Radiation Effects Data Workshop (REDW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NSREC.2016.7891736","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
SEL Site Localization Using Masking and PEM Imaging Techniques: A Case Study on Xilinx 28nm 7-Series FPGAs
An unusual methodology for localizing sparse SEL-susceptible sites was successfully used to isolate the die region and identify the sensitive subcircuit responsible for a low cross-section, low-current latchup susceptibility in Xilinx 28nm 7-Series FPGAs. Die masking and photoemission electron microscopy (PEM) imaging contributed to the identification of the circuitry responsible for the latchup susceptibility in 7-Series devices. These results point to a possible approach for using selected devices from this family in high reliability space applications.