由于单个MOS界面陷阱和载流子捕获/发射过程中的相互作用而产生的电荷泵电流的精确测量

T. Tsuchiya
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引用次数: 0

摘要

我们首次成功地测量了单个界面阱的电荷泵送电流,并发现单个阱的最大电荷泵送电流变化很大,通常小于fq (f为栅极脉冲频率,q为电子电荷)。从脉宽相关CP电流的详细实验结果中,我们得出结论,这种现象是由于载流子捕获/发射过程中单个界面陷阱之间的相互作用。这些发现对于利用Shockley-Read-Hall理论描述半导体中的载流子捕获/脱捕获现象非常重要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Accurate measurements of the charge pumping current due to individual MOS interface traps and interactions in the carrier capture/emission processes
We have successfully measured accurate charge pumping (CP) currents for individual interface traps for the first time, and discovered that the maximum CP current for a single trap is various and usually less than fq (f is the gate pulse frequency, q is the electron charge). From detailed experimental results of the pulse-width dependent CP current, we concluded that the phenomenon is due to the interaction between individual interface traps in the carrier capture/emission processes. These findings are extremely important for describing the carrier trapping/detrapping phenomena in semiconductors using the Shockley-Read-Hall Theory.
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