亚微米CMOS中的I/sub DDQ/表征

A. Ferré, J. Figueras
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引用次数: 44

摘要

I/sub DDQ/测试的有效性要求适当区分有缺陷和无缺陷的静态电流。因此,人们对描述这些洋流的兴趣越来越大。在本文中,我们的重点是无缺陷的I/sub DDQ/电流表征。在按比例缩小的器件中,研究了I/sub DDQ/与通道长度扩展的关系。得到了亚阈值电流优势技术的I/sub DDQ/分布。最后,根据可接受的产量损失和信道长度的标准偏差,确定I/sub DDQ/测试限制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
I/sub DDQ/ characterization in submicron CMOS
The effectiveness of I/sub DDQ/ testing requires appropriate discriminability of defective and non-defective quiescent currents. Consequently, the interest in characterizing these currents is growing. In this paper we focus our attention on the non-defective I/sub DDQ/ current characterization. The dependence of I/sub DDQ/ on the channel length spread in scaled down devices is examined. The I/sub DDQ/ distribution of a subthreshold current dominant technology is obtained. Finally, I/sub DDQ/ test limits depending on acceptable yield loss and standard deviation of the channel length are determined.
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