T. Katoh, N. Nishi, M. Fukagawa, H. Ueno, S. Sugiyama
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Direct writing for three-dimensional microfabrication using synchrotron radiation etching
This paper presents rapid three-dimensional microfabrication technologies for PTFE by direct writing with the TIEGA process, a LIGA-like process which replaces hard X-ray lithography with synchrotron radiation (SR) direct photo-etching. The etching rates of this process are of the order of 6-100 /spl mu/m/min, depending on the photon flux of the SR light. An X-ray lathe has been modified into an SR etching lathe to form cylindrical, helical, pyramidal, ellipsoidal, and other nonplanar objects. A metallic wire covered with a PTFE sheet is rotated and/or moved while being irradiated with SR through a mask. Moreover, direct writing without using any masks has been developed, by combining a scanning stage with a high degree of freedom under an He atmosphere, for creating any microstructure. The capabilities of these technologies and initial fabrication results are described here.
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