Impact of random telegraph noise on CMOS logic delay uncertainty under low voltage operation

T. Matsumoto, K. Kobayashi, H. Onodera
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引用次数: 26

Abstract

Statistical nature of RTN-induced delay fluctuation is described by measuring 2,520 ROs fabricated in a commercial 40 nm CMOS technology. Small number of samples have a large RTN-induced delay fluctuation. RTN-induced delay fluctuation becomes as much as 10.4% of nominal oscillation frequency under low supply voltage (0.65V). By slightly increasing the transistor size, more than 50% reduction of frequency uncertainty can be achieved under 0.75V operation. The impact of the parameters that can be changed by circuit designers is clarified in view of RTN-induced CMOS logic delay uncertainty.
低电压下随机电报噪声对CMOS逻辑延迟不确定性的影响
通过测量商用40纳米CMOS技术制造的2520个ROs,描述了rtn诱导延迟波动的统计性质。少量样本具有较大的rtn诱导延迟波动。在低电源电压(0.65V)下,rtn引起的延迟波动可达标称振荡频率的10.4%。通过稍微增加晶体管尺寸,在0.75V工作下可以实现50%以上的频率不确定性降低。针对rtn引起的CMOS逻辑延迟不确定性,阐明了电路设计者可以改变的参数的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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