In situ quantitative field emission imaging using a low-cost CMOS imaging sensor

IF 1.4 4区工程技术

Journal of Vacuum Science & Technology B Pub Date : 2022-01-01 DOI:10.1116/6.0001551

A. Schels, S. Edler, F. Herdl, W. Hansch, M. Bachmann, Daniela Ritter, Markus Dudeck, F. Düsberg, M. Meyer, A. Pahlke, M. Hausladen, P. Buchner, R. Schreiner

引用次数: 2

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采用低成本CMOS成像传感器的原位定量场发射成像

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Journal of Vacuum Science & Technology B 工程技术-工程：电子与电气

自引率

14.30%

发文量

审稿时长

2.5 months

期刊介绍： Journal of Vacuum Science & Technology B emphasizes processing, measurement and phenomena associated with micrometer and nanometer structures and devices. Processing may include vacuum processing, plasma processing and microlithography among others, while measurement refers to a wide range of materials and device characterization methods for understanding the physics and chemistry of submicron and nanometer structures and devices.