Power Integrity Performance Gain of a Novel Integrated Stack Capacitor (ISC) Solution for High-end Computing Applications

Eunseok Song, D. Oh, S. Cha, Jae-gwon Jang, Taejoo Hwang, Gyoungbum Kim, J. Kim, S. Min, Kilsoo Kim, Dae-woo Kim, Seung-Bum Yoon
{"title":"Power Integrity Performance Gain of a Novel Integrated Stack Capacitor (ISC) Solution for High-end Computing Applications","authors":"Eunseok Song, D. Oh, S. Cha, Jae-gwon Jang, Taejoo Hwang, Gyoungbum Kim, J. Kim, S. Min, Kilsoo Kim, Dae-woo Kim, Seung-Bum Yoon","doi":"10.1109/ectc32862.2020.00215","DOIUrl":null,"url":null,"abstract":"An integrated stack capacitor (ISC) solution, which can effectively suppress power noise in high frequency bands, is introduced. The basic structure of the ISC is a vertical cylinder array consisting of many capacitive vias. The proposed ISC shows high capacitance density compared to the existing silicon capacitors. In this study, the power integrity (PI) performance gain of the proposed ISC solution was analyzed by applying it to the advanced package platforms such as 2.5D silicon interposer, fanout (FO) package, RDL interposer, and substrate based chiplet. Based on 3D wafer on wafer (WoW) technology, ISC is a not only 2.5D silicon interposer for high performance computing (HPC) and server that operates with high power, but also a novel silicon capacitor solution that can be applied to substrate and fanout packages for mobile and automotive.","PeriodicalId":6722,"journal":{"name":"2020 IEEE 70th Electronic Components and Technology Conference (ECTC)","volume":"49 1","pages":"1358-1362"},"PeriodicalIF":0.0000,"publicationDate":"2020-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE 70th Electronic Components and Technology Conference (ECTC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ectc32862.2020.00215","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6

Abstract

An integrated stack capacitor (ISC) solution, which can effectively suppress power noise in high frequency bands, is introduced. The basic structure of the ISC is a vertical cylinder array consisting of many capacitive vias. The proposed ISC shows high capacitance density compared to the existing silicon capacitors. In this study, the power integrity (PI) performance gain of the proposed ISC solution was analyzed by applying it to the advanced package platforms such as 2.5D silicon interposer, fanout (FO) package, RDL interposer, and substrate based chiplet. Based on 3D wafer on wafer (WoW) technology, ISC is a not only 2.5D silicon interposer for high performance computing (HPC) and server that operates with high power, but also a novel silicon capacitor solution that can be applied to substrate and fanout packages for mobile and automotive.
用于高端计算应用的新型集成堆叠电容器(ISC)解决方案的功率完整性性能增益
介绍了一种能有效抑制高频段功率噪声的集成堆叠电容(ISC)方案。ISC的基本结构是由许多电容过孔组成的垂直圆柱阵列。与现有的硅电容器相比,所提出的ISC具有较高的电容密度。在本研究中,通过将所提出的ISC解决方案应用于先进的封装平台,如2.5D硅中间层、扇出(FO)封装、RDL中间层和基于衬底的芯片,分析了其功率完整性(PI)性能增益。基于3D晶圆对晶圆(WoW)技术,ISC不仅是一种用于高性能计算(HPC)和高功率服务器的2.5D硅中间体,也是一种新型硅电容器解决方案,可应用于移动和汽车的基板和扇出封装。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信