Bonding and reliability assessment of 30 μm pitch solder micro bump interconnection with various UBM structure for 3D chip stacking

Shin-Yi Huang, C. Zhan, Su-Ching Chung, Chia-Wen Fan, Su-Mei Chen, Tao-Chih Chang, Tai-Hong Chen
{"title":"Bonding and reliability assessment of 30 μm pitch solder micro bump interconnection with various UBM structure for 3D chip stacking","authors":"Shin-Yi Huang, C. Zhan, Su-Ching Chung, Chia-Wen Fan, Su-Mei Chen, Tao-Chih Chang, Tai-Hong Chen","doi":"10.1109/IMPACT.2011.6117257","DOIUrl":null,"url":null,"abstract":"With the increased demand of multifunction in electronic device, downscaling of interconnection pitch presents an important role for the next generation electronics with high performance, small form factor, low cost and heterogeneous integration. In the current types of interconnects, solder micro bumps have received much attention due to its low cost of material and process. For fine pitch solder micro bump interconnections, selection of under bump metallurgical material is a crucial issue because the solder micro bump joints with different kinds of UBM material will present varied reliability performances. However, which structure of solder micro bump joint shows the better reliability properties is not concluded yet until now. In this study, three-dimensional (3D) chip stacking using 30μm pitch interconnects with lead-free solder bumps and two types of UBM material is described. The reliability of solder micro bump interconnection with varied UBM material is also discussed. Assembly of the chip-on-chip test vehicle with a micro bumps diameter of 18 μm and a pitch of 30 μm was conducted. There were more than 3000 micro bumps with Sn2.5Ag solder material on both the silicon chip and carrier. Two kinds of UBM layer on Si chip were selected in this study: one was single copper layer with a thickness of 8 μm and the other was Cu/Ni layer with a total thickness of 8 μm. The UBM was electro-plated on Al trace and then the Sn2.5Ag solder with a thickness of 5 μm was deposited. During bonding process, the micro joints were formed at a peak temperature of 250 °C and the microgaps between chips were then filled by a capillary underfill cured at 150°C for 30 min. In this study, we evaluate the effect of fluxless bonding on the joining ability of solder micro bumps. The influence of underfill on the reliability of solder micro bump interconnections was estimated also. Subsequently, the chip-stacking modules were inspected by an X-ray and a scanning acoustic microscope (SAM) to determine the quality of micro joints including bonding accuracy, formation of interconnections and the percentage of voids within the underfill. Afterwards, the moisture sensitivity level 3 pre-conditioning test and temperature cycle test for 1000 cycles were performed to evaluate the reliability of solder micro bump interconnects. The results of reliability test revealed that the introduction of underfill could apparently enhance the reliability performance of micro joint under mechanical evaluation.","PeriodicalId":6360,"journal":{"name":"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)","volume":"71 1","pages":"454-457"},"PeriodicalIF":0.0000,"publicationDate":"2011-12-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMPACT.2011.6117257","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

With the increased demand of multifunction in electronic device, downscaling of interconnection pitch presents an important role for the next generation electronics with high performance, small form factor, low cost and heterogeneous integration. In the current types of interconnects, solder micro bumps have received much attention due to its low cost of material and process. For fine pitch solder micro bump interconnections, selection of under bump metallurgical material is a crucial issue because the solder micro bump joints with different kinds of UBM material will present varied reliability performances. However, which structure of solder micro bump joint shows the better reliability properties is not concluded yet until now. In this study, three-dimensional (3D) chip stacking using 30μm pitch interconnects with lead-free solder bumps and two types of UBM material is described. The reliability of solder micro bump interconnection with varied UBM material is also discussed. Assembly of the chip-on-chip test vehicle with a micro bumps diameter of 18 μm and a pitch of 30 μm was conducted. There were more than 3000 micro bumps with Sn2.5Ag solder material on both the silicon chip and carrier. Two kinds of UBM layer on Si chip were selected in this study: one was single copper layer with a thickness of 8 μm and the other was Cu/Ni layer with a total thickness of 8 μm. The UBM was electro-plated on Al trace and then the Sn2.5Ag solder with a thickness of 5 μm was deposited. During bonding process, the micro joints were formed at a peak temperature of 250 °C and the microgaps between chips were then filled by a capillary underfill cured at 150°C for 30 min. In this study, we evaluate the effect of fluxless bonding on the joining ability of solder micro bumps. The influence of underfill on the reliability of solder micro bump interconnections was estimated also. Subsequently, the chip-stacking modules were inspected by an X-ray and a scanning acoustic microscope (SAM) to determine the quality of micro joints including bonding accuracy, formation of interconnections and the percentage of voids within the underfill. Afterwards, the moisture sensitivity level 3 pre-conditioning test and temperature cycle test for 1000 cycles were performed to evaluate the reliability of solder micro bump interconnects. The results of reliability test revealed that the introduction of underfill could apparently enhance the reliability performance of micro joint under mechanical evaluation.
不同UBM结构的30 μm间距焊料微凸点互连用于三维芯片堆叠的连接及可靠性评估
随着电子器件多功能需求的增加,互连间距的缩小对高性能、小尺寸、低成本和异构集成的下一代电子产品具有重要意义。在目前的互连类型中,焊料微凸点因其材料和工艺成本低而受到广泛关注。对于细间距焊料微凸点互连,凹凸下冶金材料的选择是一个关键问题,因为不同类型的UBM材料的焊料微凸点会表现出不同的可靠性性能。然而,焊料微凸点的哪一种结构具有更好的可靠性性能,目前还没有定论。在这项研究中,描述了使用30μm间距的无铅焊点和两种类型的UBM材料进行三维(3D)芯片堆叠。讨论了不同UBM材料的焊料微凸点互连的可靠性。组装了直径为18 μm、间距为30 μm的片上微凸点测试车。在硅片和载体上都有超过3000个Sn2.5Ag钎料的微凸点。本研究选择了两种硅片上的UBM层,一种是厚度为8 μm的单铜层,另一种是总厚度为8 μm的Cu/Ni层。将UBM电镀在Al线上,然后沉积厚度为5 μm的Sn2.5Ag焊料。在焊接过程中,微接头在250℃的峰值温度下形成,然后用150℃固化30 min的毛细底填料填充芯片之间的微间隙。在本研究中,我们评估了无焊剂焊接对焊料微凸起连接能力的影响。分析了下填料对焊料微凸点互连可靠性的影响。随后,通过x射线和扫描声学显微镜(SAM)检查芯片堆叠模块,以确定微关节的质量,包括粘合精度、互连的形成和下填料内的空隙百分比。然后进行3级湿敏预调节试验和1000次循环温度循环试验,评估焊料微凸点互连的可靠性。可靠性试验结果表明,下填体的引入可以明显提高微节理在力学评价下的可靠性性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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