Comprehensive and easy to use SEM analysis structures for BiCMOS process development

Abstract

A comprehensive, yet easily used, set of SEM analysis structures is presented. These are currently being used in the development of a 0.35 micron, three layer metal, BiCMOS process flow. A summary list of the structure types and arrangements, key design considerations, SEM photographic results, and recommendations for improvement are included. A key design feature, a unique device navigation system allowing quick and accurate location of any particular structure is explained. Without such a feature, analysis would be difficult due to the large number, lateral size, and similarity of the various constructions.