High Lateral Resolution Auger Electron Spectroscopic (AES) Measurements for Sn Whiskers on Brass

M. Bozack, E. R. Crandall, C. L. Rodekohr, R. Dean, G. Flowers, J. Suhling
{"title":"High Lateral Resolution Auger Electron Spectroscopic (AES) Measurements for Sn Whiskers on Brass","authors":"M. Bozack, E. R. Crandall, C. L. Rodekohr, R. Dean, G. Flowers, J. Suhling","doi":"10.1109/TEPM.2010.2048217","DOIUrl":null,"url":null,"abstract":"We report high lateral resolution Auger electron spectroscopic (AES) measurements on high aspect ratio Sn whiskers. The whiskers were grown from compressively stressed thin films (~ 6000 Å) of Sn on brass using a magnetron sputtering system. The Auger spectra show that, after sputter cleaning, the whisker is nearly 100% Sn at all locations along the whisker shaft, at the growing blunt end of the shaft, and with depth (~ 1000 Å) into the side of the whisker. The “as received” Sn whisker surface shows the expected ~ 200 Å of native Sn oxide at all locations and the O signal nearly disappeared (~ 3 atom%) after 200 Å of sputter cleaning. There was no evidence of high amounts of oxygen within the bulk of the whisker. That brass is not observed in the whisker shaft supports the notion that whisker formation is accompanied by material mass transport through interfaces and grain boundaries which causes stress (usually compressive) relief. This is supported by the most remarkable aspect of the whisker growth; namely, that high aspect ratio Sn whiskers ~ 100-500 μm in length containing no brass can be grown from a ~ 0.6 μm thin film of Sn.","PeriodicalId":55010,"journal":{"name":"IEEE Transactions on Electronics Packaging Manufacturing","volume":"39 1","pages":"198-204"},"PeriodicalIF":0.0000,"publicationDate":"2010-05-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"11","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electronics Packaging Manufacturing","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/TEPM.2010.2048217","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 11

Abstract

We report high lateral resolution Auger electron spectroscopic (AES) measurements on high aspect ratio Sn whiskers. The whiskers were grown from compressively stressed thin films (~ 6000 Å) of Sn on brass using a magnetron sputtering system. The Auger spectra show that, after sputter cleaning, the whisker is nearly 100% Sn at all locations along the whisker shaft, at the growing blunt end of the shaft, and with depth (~ 1000 Å) into the side of the whisker. The “as received” Sn whisker surface shows the expected ~ 200 Å of native Sn oxide at all locations and the O signal nearly disappeared (~ 3 atom%) after 200 Å of sputter cleaning. There was no evidence of high amounts of oxygen within the bulk of the whisker. That brass is not observed in the whisker shaft supports the notion that whisker formation is accompanied by material mass transport through interfaces and grain boundaries which causes stress (usually compressive) relief. This is supported by the most remarkable aspect of the whisker growth; namely, that high aspect ratio Sn whiskers ~ 100-500 μm in length containing no brass can be grown from a ~ 0.6 μm thin film of Sn.
黄铜上锡晶须的高横向分辨率俄歇电子能谱(AES)测量
我们报道了高纵横比Sn晶须的高横向分辨率俄歇电子能谱(AES)测量。利用磁控溅射系统,在黄铜表面的压缩应力薄膜(~ 6000 Å)上生长出晶须。俄歇光谱表明,在溅射清洗后,晶须沿晶须轴的所有位置、晶须轴的生长钝端以及晶须侧面的深度(~ 1000 Å)都接近100%的Sn。接收到的Sn晶须表面在所有位置都显示出预期的~ 200 Å天然氧化锡,并且在200 Å溅射清洗后O信号几乎消失(~ 3原子%)。没有证据表明,在大部分的晶须中含有大量的氧气。在晶须轴中没有观察到黄铜,这支持了晶须形成伴随着物质通过界面和晶界的传输,从而导致应力(通常是压缩)缓解的概念。这一点得到了晶须生长最显著方面的支持;即在~ 0.6 μm的Sn薄膜上生长出长度为100 ~ 500 μm且不含黄铜的高长宽比Sn晶须。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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