Overcoming DRAM scaling limitations by employing straight recessed channel array transistors with <100> uni-axial and [100] uni-plane channels

I. Kim, S. Park, J. Yoon, D. Kim, J.Y. Noh, J. Lee, Y. Kim, M. Hwang, K. Yang, Joosung Park, Kyungseok Oh
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引用次数: 4

Abstract

Recessed channel array transistors (RCAT) for DRAM are implemented with <100> uni-axial and {100} uni-plane channels for the first time. It is found that this structure improves the cell transistor drivability by 25% with the improvement being more effective in straight shape active RCAT than the diagonal shape active RCAT due to the larger dimension of the horizontal <100> axial channel in the {100} plane. Enhanced RCAT drivability improves tRDL (allowed time interval between data-in and word-line precharge) and retention time, which allows for lowering the gate voltage over-drive (VPP) in DRAM operation. This possibility provides a breakthrough in reliability limitations and leads to better performance in nano-scaled DRAM
通过采用具有单轴和[100]单平面通道的直凹槽通道阵列晶体管克服DRAM的缩放限制
用于DRAM的凹槽通道阵列晶体管(RCAT)首次实现了单轴和{100}单平面通道。研究发现,这种结构将电池晶体管的驱动性提高了25%,并且由于{100}平面上的水平轴向通道尺寸更大,直线型有源RCAT比对角线型有源RCAT的改进更有效。增强的RCAT可驾驶性提高了tRDL(数据输入和字行预充电之间的允许时间间隔)和保持时间,从而降低了DRAM操作中的栅极电压过度驱动(VPP)。这种可能性为可靠性限制提供了突破,并导致纳米级DRAM的更好性能
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