Reliability Investigation of Ultra Fine Line, Multi-Layer Copper Routing for Fan-Out Packaging Using a Newly Designed Micro Tensile Test Method

Abstract

Fan-Out enables new heterogeneous packaging concepts where chips are embedded in an electronic mold compound (EMC) package with ultra-small footprint. These multi-chip systems demand a high routing density in the redistribution layer (RDL) which is realized by fine copper features with line and space structures in the dimension down to 2 μm, establishing electrical interconnects between the chips across different substrate materials (e.g. silicon chips and mold-filled gaps). The copper lines undergo high mechanical stress due different thermal expansion coefficients of the used materials. Numerous papers investigated reliability topics only focusing on properties of the polymer in the redistribution layer and the solder ball material, but the influence of the mechanical properties of electroplated copper has been a minor topic so far [1] [2] [3].With feature sizes and thicknesses of about 2 μm, these structures are in the range of copper grain size with the result that different grain structures become more important. Also, the material suppliers start to tune galvanic copper baths to generate e.g. twinned copper structures with mechanically superior behavior. Characterizing these fine structures at that scale is challenging because the properties could be different compared to macro samples. This work presents an on-wafer characterization method of copper features down to 2 μm with a newly designed wafer scale micro tensile test. This concept allows a test integration in the fab process flow. The elongation at break and the tensile strength of ultra fine line copper lines are measured by the tensile loading. The results are compared with macro scale tensile tests.