Conductive bridging RAM (CBRAM): an emerging non-volatile memory technology scalable to sub 20nm

M. Kund, Gerhard Beitel, C. Pinnow, Thomas Röhr, Jörg Schumann, R. Symanczyk, K. Ufert, Gerhard Müller
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引用次数: 263

Abstract

We report on the electrical characterisation of nanoscale conductive bridging memory cells, composed of a thin solid state electrolyte layer sandwiched between an oxidizable anode and an inert cathode. Low power resistive switching operation, the large scalability potential including multi-level-capability (MLC) and the investigated reliability aspects, like retention at elevated temperature, operating temperature and endurance, make CBRAM a very promising non-volatile emerging memory technology
导电桥接RAM (CBRAM):一种新兴的可扩展到20nm以下的非易失性存储技术
我们报告了纳米级导电桥接记忆电池的电学特性,该电池由夹在可氧化阳极和惰性阴极之间的薄固态电解质层组成。低功耗的阻性开关操作,包括多层能力(MLC)在内的巨大可扩展性潜力以及所研究的可靠性方面,如高温保留,工作温度和耐用性,使CBRAM成为一种非常有前途的非易失性新兴存储技术
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