Estimation for equivalent thermal conductivity of silicon-through vias TSVs used for 3D IC integration

H. Chien, J. Lau, Y. Chao, R. Tain, M. Dai, W. Lo, M. Kao
{"title":"Estimation for equivalent thermal conductivity of silicon-through vias TSVs used for 3D IC integration","authors":"H. Chien, J. Lau, Y. Chao, R. Tain, M. Dai, W. Lo, M. Kao","doi":"10.1109/IMPACT.2011.6117240","DOIUrl":null,"url":null,"abstract":"In this study, thermal performance of 3D IC integration is investigated. Emphasis is placed on the determination of a set of equivalent thermal conductivity equations for Cu-filled TSVs with various TSV diameters, TSV pitches, TSV thicknesses, passivation thicknesses, and microbump pads. Also, a slice model to imitate a 3D memory stacked chip is adopted to verify the accuracy of the equivalent equations. Finally, the feasibility of these equivalent equations is demonstrated through a simple 3D IC integration structure.","PeriodicalId":6360,"journal":{"name":"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)","volume":"77 1","pages":"153-156"},"PeriodicalIF":0.0000,"publicationDate":"2011-12-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"16","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMPACT.2011.6117240","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 16

Abstract

In this study, thermal performance of 3D IC integration is investigated. Emphasis is placed on the determination of a set of equivalent thermal conductivity equations for Cu-filled TSVs with various TSV diameters, TSV pitches, TSV thicknesses, passivation thicknesses, and microbump pads. Also, a slice model to imitate a 3D memory stacked chip is adopted to verify the accuracy of the equivalent equations. Finally, the feasibility of these equivalent equations is demonstrated through a simple 3D IC integration structure.
用于三维集成电路集成的硅通孔tsv等效导热系数的估算
本文对三维集成电路的热性能进行了研究。重点是确定具有不同TSV直径、TSV间距、TSV厚度、钝化厚度和微凹凸垫的cu填充TSV的一组等效导热方程。同时,采用切片模型模拟三维存储堆叠芯片,验证了等效方程的准确性。最后,通过一个简单的三维集成电路结构验证了这些等效方程的可行性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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