Shuying Ma, Jia-Hwang Chang, Jiao Wang, Daquan Yu, A. Xiao, Xiaobing Yang, Tony Curtis
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引用次数: 3
Abstract
With the rise of artificial intelligence, automatic driving, 5G, Internet of things and other emerging industries, the demand of 3D integrated packaging technology is increasing strongly to meet the ever-increasing market demands of high performance, small size, high reliability and ultra-low power consumption. This paper presents a new 3D system integrated packaging technology named embedded system in chip (eSinC®) technology. This technology is a combination of TSV technology and eSiFO technology which has been reported in 2016 [1]-[4]. After finishing the standard eSiFO process, backside RDLs and via last TSV process were fabricated by using laser temporary bonding technology. A totally three stacking package including five chips with two layer frontside and backside RDLs was fabricated successfully. Individual package was connected by micro bumps and TSVs. The packaging size is 5×5mm with an overall 0.78mm packaging thickness, while the individual eSinC packaging thickness is 0.28mm. Several key technologies were developed to achieve eSinC package, including high aspect ratio TSVs, wafer thin and handling, low temperature PECVD process, as well as temporary bonding. Good electrical yield was achieved after process optimization.
随着人工智能、自动驾驶、5G、物联网等新兴产业的兴起,对3D集成封装技术的需求日益强劲,以满足市场对高性能、小尺寸、高可靠性、超低功耗不断增长的需求。本文提出了一种新的三维系统集成封装技术——eSinC (embedded system in chip)技术。该技术是TSV技术和eSiFO技术的结合,2016年有报道[1]-[4]。在完成标准eSiFO工艺后,采用激光临时键合技术制备了背面rdrl和通过最后的TSV工艺。成功地制作了一个包含5个芯片、前后两层rld的三层堆叠封装。单个包装通过微凸起和tsv连接。包装尺寸为5×5mm,整体包装厚度为0.78mm,而eSinC的单个包装厚度为0.28mm。开发了实现eSinC封装的几个关键技术,包括高纵横比tsv、晶圆薄化和处理、低温PECVD工艺以及临时键合。经过工艺优化,获得了较好的电产率。