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Process technology high-k ii: gate dielectrics

IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest. Pub Date : 2005-12-05 DOI:10.1109/IEDM.2005.1609365
H. Watanabe, G. Jin
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工艺技术高k:栅极电介质
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IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest.
IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest.
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