High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation

IF 2.4 3区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Journal of Vacuum Science & Technology A Pub Date : 2022-03-01 DOI:10.1116/6.0001394

J. Mayandi, M. Schrade, P. Vajeeston, M. Stange, A. Lind, M. Sunding, J. Deuermeier, E. Fortunato, O. Løvvik, A. Ulyashin, S. Diplas, P. Carvalho, T. Finstad

引用次数: 3

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高熵合金CrFeNiCoCu溅射沉积薄膜:结构、电学性能和氧化

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Journal of Vacuum Science & Technology A 工程技术-材料科学：膜

CiteScore

5.10

自引率

10.30%

发文量

247

审稿时长

2.1 months

期刊介绍： Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.