High mobility zinc oxynitride-TFT with operation stability under light-illuminated bias-stress conditions for large area and high resolution display applications

Myungkwan Ryu, Tae Sang Kim, K. Son, Hyun-Suk Kim, Joonsuk Park, Jong‐Baek Seon, Seok-Jun Seo, Sun‐Jae Kim, Eunha Lee, Hyungik Lee, S. Jeon, Seungwu Han, Sang Yoon Lee
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引用次数: 20

Abstract

We have investigated material and electrical properties of ZnON based on 1st principle calculations and TFT evaluations. Theoretically, ZnON has high mobility characteristics and band-structure for high stability. Fabricated TFTs exhibited high mobility (100 cm2/Vs), good uniformity, and stable operation performance such as -2.87 V of Vth-shift under light illuminated bias-stress condition. As a new approach to overcome the performance limit of oxide-semiconductors, ZnON technology is strongly promising to achieve high mobility and operation stability required for next generation displays.
高迁移率氧化锌氮化tft,在光照偏应力条件下具有稳定的操作,适用于大面积和高分辨率显示应用
我们在第一性原理计算和TFT评价的基础上研究了ZnON的材料和电学性质。理论上,ZnON具有高迁移率特性和高稳定性的能带结构。制备的tft具有高迁移率(100 cm2/Vs),均匀性好,在光照射偏压条件下vth位移-2.87 V等稳定的工作性能。作为一种克服氧化物半导体性能限制的新方法,ZnON技术有望实现下一代显示器所需的高移动性和操作稳定性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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