BF/sub 2//sup +/ implant: a fluorine bubble induced ET failure

Abstract

Fluorine bubbles are a known result of BF/sub 2//sup +/ high energy implants. This work presents a failure mechanism induced by gross fluorine bubbles, that allows poly silicon to be damaged during its subsequent cobalt silicide etch. An alternative implant that includes both BF/sub 2//sup +/ and B11 may alleviate the effects of F precipitates without eliminating the benefits of BF/sub 2//sup +/ self-amorphizing the substrate.