Defect Morphology and Texture in Sn, Sn–Cu, and Sn–Cu–Pb Electroplated Films

P. Sarobol, A. Pedigo, P. Su, J. Blendell, C. Handwerker
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引用次数: 30

Abstract

In this paper, the concept of a defect phase diagram is introduced which quantifies the effects of Cu and Pb additions to electrodeposited Sn films on surface defect formation, including but not limited to the formation of Sn whiskers. Transitions were observed in both the defect densities and the morphologies of hillocks and whiskers as Cu and Pb film compositions were systematically varied. Changes in crystallographic texture were also reported for a subset of the Sn-Cu-Pb alloys examined. The transitions between different defect types and the coexistence of certain defect types help to interpret the role of grain boundary pinning in hillock and whisker formation.
Sn, Sn - cu和Sn - cu - pb电镀膜的缺陷形貌和织构
本文引入了缺陷相图的概念,量化了Cu和Pb添加到电沉积锡薄膜中对表面缺陷形成的影响,包括但不限于锡晶须的形成。随着Cu和Pb薄膜成分的系统变化,缺陷密度和丘状和晶须的形貌都发生了转变。在晶体结构的变化也报告了一个子集的Sn-Cu-Pb合金的检查。不同缺陷类型之间的转换和某些缺陷类型的共存有助于解释晶界钉住在丘状和晶须形成中的作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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