Photoactivated Ru chemical vapor deposition using (η3-allyl)Ru(CO)3X (X = Cl, Br, I): From molecular adsorption to Ru thin film deposition

IF 2.4 3区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Journal of Vacuum Science & Technology A Pub Date : 2022-03-01 DOI:10.1116/6.0001490

Bryan G. Salazar, Christopher R. Brewer, L. McElwee‐White, A. Walker

引用次数: 1

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利用(η - 3-烯丙基)Ru(CO)3X (X = Cl, Br, I)光活化Ru化学气相沉积:从分子吸附到Ru薄膜沉积

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来源期刊

Journal of Vacuum Science & Technology A 工程技术-材料科学：膜

CiteScore

5.10

自引率

10.30%

发文量

247

审稿时长

2.1 months

期刊介绍： Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.