{"title":"13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference. Advancing the Science and Technology of Semiconductor Manufacturing. ASMC 2002 (Cat. No.02CH37259)","authors":"","doi":"10.1109/ASMC.2002.1001562","DOIUrl":null,"url":null,"abstract":"The following topics are dealt with: advanced FEOL processing; fab dynamics; yield enhancement tools and methods; process control methodology; resource productivity management; yield modeling, analysis and enhancement; defect-free manufacturing; contamination-free manufacturing; cost management methodologies; advanced BEOL processing; advanced metrology.","PeriodicalId":64779,"journal":{"name":"半导体技术","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2002-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"半导体技术","FirstCategoryId":"1087","ListUrlMain":"https://doi.org/10.1109/ASMC.2002.1001562","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
The following topics are dealt with: advanced FEOL processing; fab dynamics; yield enhancement tools and methods; process control methodology; resource productivity management; yield modeling, analysis and enhancement; defect-free manufacturing; contamination-free manufacturing; cost management methodologies; advanced BEOL processing; advanced metrology.