{"title":"Fast Optical Proximity Correction Using Graph Convolutional Network With Autoencoders","authors":"Gangmin Cho;Taeyoung Kim;Youngsoo Shin","doi":"10.1109/TSM.2023.3306751","DOIUrl":null,"url":null,"abstract":"OPC is a very time consuming process for mask synthesis. Quick and accurate OPC using GCN with layout encoder and mask decoder is proposed. (1) GCN performs a series of aggregation with MLP for correction process. A feature of a particular polygon is aggregated with weighted features of neighbor polygons; this is a key motivation of using GCN since one polygon should be corrected while its neighbors are taken into account for more accurate correction. (2) GCN inputs are provided by a layout encoder, which extracts a feature from each layout polygon. GCN outputs, features corresponding to corrected polygons, are processed by a mask decoder to yield the final mask pattern. (3) The encoder and decoder originate from respective autoencoders. High fidelity of decoder is a key for OPC quality. This is achieved by collective training of the two autoencoders with a single loss function while the encoder and decoder are connected. Experiments demonstrate that the proposed OPC achieves 47% smaller EPE than OPC using a simple MLP model.","PeriodicalId":451,"journal":{"name":"IEEE Transactions on Semiconductor Manufacturing","volume":"36 4","pages":"629-635"},"PeriodicalIF":2.3000,"publicationDate":"2023-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Semiconductor Manufacturing","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10225430/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
OPC is a very time consuming process for mask synthesis. Quick and accurate OPC using GCN with layout encoder and mask decoder is proposed. (1) GCN performs a series of aggregation with MLP for correction process. A feature of a particular polygon is aggregated with weighted features of neighbor polygons; this is a key motivation of using GCN since one polygon should be corrected while its neighbors are taken into account for more accurate correction. (2) GCN inputs are provided by a layout encoder, which extracts a feature from each layout polygon. GCN outputs, features corresponding to corrected polygons, are processed by a mask decoder to yield the final mask pattern. (3) The encoder and decoder originate from respective autoencoders. High fidelity of decoder is a key for OPC quality. This is achieved by collective training of the two autoencoders with a single loss function while the encoder and decoder are connected. Experiments demonstrate that the proposed OPC achieves 47% smaller EPE than OPC using a simple MLP model.
期刊介绍:
The IEEE Transactions on Semiconductor Manufacturing addresses the challenging problems of manufacturing complex microelectronic components, especially very large scale integrated circuits (VLSI). Manufacturing these products requires precision micropatterning, precise control of materials properties, ultraclean work environments, and complex interactions of chemical, physical, electrical and mechanical processes.