Deposition of zinc oxide thin films by an atmospheric pressure plasma jet

IF 2.4 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films Pub Date : 2011-03-01 Epub Date: 2010-12-24 DOI:10.1016/j.tsf.2010.12.156

Yao-wen Hsu, Hsin-Chieh Li, Yao-Jhen Yang, Cheng-che Hsu

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引用次数: 52

Abstract

The ZnO thin film deposition process by using an atmospheric pressure (AP) plasma jet is studied. In this process, nebulized ZnCl₂ solution is sprayed into the downstream of the nitrogen plasma jet to perform thin film deposition. X-ray diffraction analysis confirms that this AP jet has the capability to convert ZnCl₂ solution to well-crystallized ZnO thin films with a hexagonal wurtzite structure in a short time. This film exhibits a smooth and mirror-like appearance visually. Scanning electron microscopy and atomic force microscopy show that the deposited film is dense and continuous with a root mean square surface roughness of 8.6 nm. A 1.29 nm/s deposition rate is obtained using this process. Given the fast deposition rate, we believe that both the temperature and the reactivity of the plasma play important roles. A ZnO film on a larger substrate is fabricated, which suggests the process capability in large area and continuous processing applications.

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用常压等离子体射流沉积氧化锌薄膜

研究了常压等离子体射流沉积ZnO薄膜的工艺。在此过程中，将雾化的ZnCl2溶液喷洒到氮气等离子体射流的下游进行薄膜沉积。x射线衍射分析证实，该AP射流具有在短时间内将ZnCl2溶液转化为具有六方纤锌矿结构的良好结晶ZnO薄膜的能力。这部影片在视觉上呈现出光滑的镜面效果。扫描电镜和原子力显微镜显示，沉积膜致密连续，表面均方根粗糙度为8.6 nm。该工艺可获得1.29 nm/s的沉积速率。考虑到快速的沉积速率，我们认为温度和等离子体的反应性都起着重要的作用。在较大的衬底上制备了ZnO薄膜，具有大面积连续加工的能力。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Thin Solid Films 工程技术-材料科学：膜

CiteScore

4.00

自引率

4.80%

发文量

381

审稿时长

7.5 months

期刊介绍： Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.