Comparative Study of Influence of Simultaneous Modulation of Upper-Coil and Lower-Coil Currents on Silicon Nanoparticles Synthesized Using Tandem-Type Modulated Induction Thermal Plasmas

IF 2.5 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL

Plasma Chemistry and Plasma Processing Pub Date : 2022-02-04 DOI:10.1007/s11090-022-10230-w

Ryudai Furukawa, Yasunori Tanaka, Y. Nagase, Y. Nakano, T. Ishijima, S. Sueyasu, S. Watanabe, K. Nakamura

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引用次数: 2

Abstract

The influences of upper-coil and lower-coil current modulation of tandem-type modulated induction thermal plasma (tandem-MITP) were studied for silicon nanoparticle synthesis using both experimental and numerical approaches. The modulation condition was set to three conditions of non-modulation, lower-coil current modulation only, and simultaneous upper-coil and lower-coil current modulation. The experimentally obtained results indicate that simultaneous modulation of the upper-coil and lower currents provides smaller nanoparticles with a lower standard deviation of particle size. This result suggests that large modulation of two coil currents can offer more rapid quenching of the temperature field in modulated induction thermal plasma. The developed numerical model also predicted provision of smaller nanoparticles by high quenching because of strong entrainment gas flow by the simultaneous modulation of upper-coil and lower coil currents. Comparison was made between the numerical result and experimentally obtained results in terms of time variation in the radiation intensity distribution, and particle size distribution, indicating fair agreement between them. From these experimentally obtained and numerical results, simultaneous modulation of the upper-coil and lower-coil currents was found to be preferable for nanoparticle synthesis.

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同时调制上、下线圈电流对串联型调制感应热等离子体合成纳米硅影响的比较研究

采用实验和数值方法研究了串联型调制感应热等离子体(tandem-MITP)上、下线圈电流调制对硅纳米颗粒合成的影响。调制条件设置为不调制、只调制下线圈电流、同时调制上线圈和下线圈电流三种条件。实验结果表明，同时调制上线圈和下电流可获得更小的纳米颗粒，粒径标准差更低。这一结果表明，在调制的感应热等离子体中，两个线圈电流的大调制可以提供更快的温度场淬火。所建立的数值模型还预测，通过同时调制上线圈和下线圈电流，通过强夹带气流的高淬火，可以提供更小的纳米颗粒。数值结果与实验结果在辐射强度分布和粒径分布的时间变化方面进行了比较，两者吻合较好。从这些实验结果和数值结果来看，同时调制上线圈和下线圈电流更有利于纳米颗粒的合成。

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.