Relationship Between Current and Mesh Cathode Structure for a Coaxial Cylindrical Diode

IF 1.3 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2023-09-01 DOI:10.1109/TPS.2023.3307426

Rongyan Wu;Yaxin Wu;Jianliang Zhou

{"title":"Relationship Between Current and Mesh Cathode Structure for a Coaxial Cylindrical Diode","authors":"Rongyan Wu;Yaxin Wu;Jianliang Zhou","doi":"10.1109/TPS.2023.3307426","DOIUrl":null,"url":null,"abstract":"Cathode current is a key measure of the rated power of the diode and is closely related to the cathode structure. Compared with \n<inline-formula> <tex-math>$\\Pi $ </tex-math></inline-formula>\n cathode and helical cathode, the mesh cathode has been more widely used in high-power tetrode, because of its structural advantage. So far, the relationship between the space charge limited current (SCLC) and the cathode structure for thermionic emission mesh cathode diode has not been reported. In this article, we develop a calculation expression of the SCLC for the mesh cathode coaxial cylindrical diode, which is based on the calculation model of the helical cathode. The results show that the calculated values are in excellent agreement with the simulated values based on CST Particle Studio. In addition, we study the dependence of the SCLC of the mesh cathode diode with the change of the cathode height, radius of the cathode filament, anode voltage, and density of the mesh. It is helpful for the optimization of the cathode structure design of vacuum tubes and microwave tubes with the coaxial cylinder mesh cathode structure.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"51 9","pages":"2647-2651"},"PeriodicalIF":1.3000,"publicationDate":"2023-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Plasma Science","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10237115/","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}

引用次数: 0

Abstract

Cathode current is a key measure of the rated power of the diode and is closely related to the cathode structure. Compared with

$\Pi $

cathode and helical cathode, the mesh cathode has been more widely used in high-power tetrode, because of its structural advantage. So far, the relationship between the space charge limited current (SCLC) and the cathode structure for thermionic emission mesh cathode diode has not been reported. In this article, we develop a calculation expression of the SCLC for the mesh cathode coaxial cylindrical diode, which is based on the calculation model of the helical cathode. The results show that the calculated values are in excellent agreement with the simulated values based on CST Particle Studio. In addition, we study the dependence of the SCLC of the mesh cathode diode with the change of the cathode height, radius of the cathode filament, anode voltage, and density of the mesh. It is helpful for the optimization of the cathode structure design of vacuum tubes and microwave tubes with the coaxial cylinder mesh cathode structure.

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同轴圆柱形二极管电流与网状阴极结构的关系

阴极电流是衡量二极管额定功率的关键，与阴极结构密切相关。与$\Pi$阴极和螺旋阴极相比，网状阴极由于其结构优势，在大功率四极管中得到了更广泛的应用。到目前为止，还没有报道热离子发射网状阴极二极管的空间电荷限制电流（SCLC）与阴极结构之间的关系。本文在螺旋阴极计算模型的基础上，建立了网状阴极同轴圆柱二极管SCLC的计算表达式。结果表明，计算值与基于CST Particle Studio的模拟值吻合良好。此外，我们还研究了网状阴极二极管的SCLC随阴极高度、阴极灯丝半径、阳极电压和网状密度的变化的关系。这有助于同轴圆柱网阴极结构的真空管和微波管阴极结构的优化设计。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.