Power- and Spatial-Dependent Characterization of Reflection and Transmission Electric Parameters of an Argon Microwave Plasma

IF 1.3 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2022-02-01 DOI:10.1109/TPS.2022.3144344

Christoph Schopp;Felix Rohrbach;Holger Heuermann

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Abstract

In this article, the power- and spatial-dependent macroscopic electrical transmission and reflection properties of an argon microwave plasma are analyzed. A custom two-port coaxial prototype is built with a variable spatial gap between two electrodes. All measurements are based on the extension of the large-signal scattering parameter (Hot-S) measuring environment and are proof-of-concept for the determination of plasma properties without an external probe. The coaxial topology of the prototype has a fixed reference impedance so that the reference planes can be located at the tip of both electrodes. An equivalent lumped element circuit valid over a wide bandwidth is investigated to simulate the linear macroscopic electromagnetic reflection and transmission properties of the plasma. A series-resonance circuit is chosen since its representation is capable of covering the measurements from 10 to 40 W of input power and gaps from 1 to 3 mm. With this circuit, a continuous relationship between the impedance, power, and the spatial dimensions of the plasma is found.

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氩微波等离子体反射和透射电参数的功率和空间依赖性表征

本文分析了氩微波等离子体的宏观电传输和反射特性与功率和空间的关系。在两个电极之间建立了一个可变空间间隙的定制双端口同轴原型。所有测量都是基于大信号散射参数(Hot-S)测量环境的扩展，并且是在没有外部探针的情况下确定等离子体特性的概念验证。原型的同轴拓扑结构具有固定的参考阻抗，因此参考平面可以位于两个电极的尖端。为了模拟等离子体的线性宏观电磁反射和透射特性，研究了一种宽带上有效的等效集总元件电路。选择串联谐振电路是因为它的表示能够覆盖从10到40w的输入功率和从1到3mm的间隙的测量。通过这种电路，发现了阻抗、功率和等离子体空间尺寸之间的连续关系。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.