Spatial and Channel-Wise Co-Attention-Based Twin Network System for Inspecting Integrated Circuit Substrate

IF 2.3 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Eunjeong Choi;Jeongtae Kim
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引用次数: 0

Abstract

We propose a deep learning-based reference comparison system based on a twin network (also known as a Siamese network) for high-performance inspection of integrated circuit (IC) substrates. However, reference comparison-based inspection methods may suffer from false positives when inspecting image pairs with variations, such as mis-registration and color changes. To address these problems, we also propose a novel co-attention module that jointly considers the spatial-wise and channel-wise correlations between a feature block in one image and all other feature blocks in the other image to find similar feature blocks in the other image. By comparing the feature block in one image with similar feature blocks in the other image, the module can reduce the differences in areas where registration errors and/or color variation exist, thereby making the proposed inspection method more robust to image variation than existing methods. We verified the usefulness of the proposed method through experiments using an IC substrate dataset. In the experiments, the proposed method achieved significantly improved performance compared with existing methods in terms of precision and f1-score when the recall is almost the same.
基于空间和通道双向关注的集成电路衬底检测双网络系统
我们提出了一种基于双网络(也称为Siamese网络)的基于深度学习的参考比较系统,用于集成电路(IC)衬底的高性能检测。然而,基于参考比较的检测方法在检测具有变化的图像对时可能会出现误报,例如配准错误和颜色变化。为了解决这些问题,我们还提出了一种新的共同关注模块,该模块联合考虑一幅图像中的特征块与另一幅图像中的所有其他特征块之间的空间和通道相关性,以找到另一幅图像中的相似特征块。通过将一幅图像中的特征块与另一幅图像中的相似特征块进行比较,该模块可以减少存在配准错误和/或颜色变化区域的差异,从而使所提出的检测方法对图像变化的鲁棒性优于现有方法。我们通过使用IC衬底数据集的实验验证了所提出方法的有效性。在实验中,在召回率基本相同的情况下,所提方法在准确率和f1-score两方面均较现有方法有了显著提高。
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来源期刊
IEEE Transactions on Semiconductor Manufacturing
IEEE Transactions on Semiconductor Manufacturing 工程技术-工程:电子与电气
CiteScore
5.20
自引率
11.10%
发文量
101
审稿时长
3.3 months
期刊介绍: The IEEE Transactions on Semiconductor Manufacturing addresses the challenging problems of manufacturing complex microelectronic components, especially very large scale integrated circuits (VLSI). Manufacturing these products requires precision micropatterning, precise control of materials properties, ultraclean work environments, and complex interactions of chemical, physical, electrical and mechanical processes.
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