Multiphysical Study of an Atmospheric Microwave Argon Plasma Jet

IF 1.3 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2017-04-25 DOI:10.1109/TPS.2017.2692735

Christoph Schopp;Holger Heuermann;Michel Marso

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引用次数: 4

Abstract

In this paper, the multiphysical and frequency-dependent characterization of a microwave argon plasma jet in the GHz range is presented. Three different frequency ranges around 1.3, 2.4, and 3.5GHz are compared using electrical, geometrical, optical, and thermal analyses for different power levels between 2 and 10 W at a constant gas flow. Based on measurements using the large signal S-parameter measuring technique, the plasma base point impedance and microwave conductivity are determined via circuit and finite-element method simulations. Major changes within a small frequency interval are exhibited. Optical measurements are dependent on the geometrical dimension changes of the microwave plasma. It is shown that the geometrical dimensions are strongly dependent on frequency and applied power. These investigated dependencies of the microwave plasma on operation conditions open up new degrees of freedom to match the frequency to the application needs. A description of different applications is given based on the different areas of the measurement results.

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大气微波氩等离子体射流的多物理场研究

本文介绍了微波氩等离子体射流在GHz范围内的多物理场和频率相关特性。在恒定气体流量下，通过电学、几何、光学和热分析，对1.3、2.4和3.5GHz三种不同的频率范围进行了比较。在大信号s参数测量技术的基础上，通过电路模拟和有限元模拟确定了等离子体的基点阻抗和微波电导率。在较小的频率间隔内显示出较大的变化。光学测量依赖于微波等离子体的几何尺寸变化。结果表明，几何尺寸与频率和功率有很大关系。这些研究的微波等离子体对操作条件的依赖关系开辟了新的自由度，使频率与应用需求相匹配。根据测量结果的不同领域，给出了不同应用的描述。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.