Wave Transmission Through a Plasma-Loaded W-Band Photonic Crystal

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Jeffrey Hopwood
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引用次数: 0

Abstract

A microplasma is sustained by millimeter waves (MMWs) at 93.37 GHz within the vacancy of a photonic crystal (PhC). The resonance of the electric field inside the vacancy creates a free-floating spherical plasma with electron density on the order of $10^{20}~\text{m}^{-3}$ . The steady-state plasma is less than 1 mm in diameter and requires only 100–600 mW of power. By probing the microplasma using an auxiliary, low-power source from 92–96 GHz, the spectrum of power absorption by the plasma is reported. The power absorption spectra shift upward in frequency due to the relative permittivity of the plasma being less than one. In combination with electromagnetic modeling, the upward frequency shift is used to extract the electron density in the central core of the plasma. The absorption spectra show a secondary absorption peak that is attributed to electron plasma resonance heating of the discharge when the plasma frequency is approximately 93 GHz.
等离子体负载w波段光子晶体的波传输
微等离子体由93.37 GHz毫米波(MMWs)在光子晶体(PhC)的空位内维持。空位内电场的共振产生一个自由漂浮的球形等离子体,其电子密度约为$10^{20}~\text{m}^{-3}$。稳态等离子体直径小于1毫米,只需要100-600兆瓦的功率。利用92 ~ 96 GHz的辅助低功率源探测微等离子体,报道了等离子体的功率吸收谱。由于等离子体的相对介电常数小于1,功率吸收光谱的频率向上移动。结合电磁学建模,利用向上移频提取等离子体中心核心的电子密度。吸收光谱显示,当等离子体频率约为93 GHz时,放电的电子等离子体共振加热产生了二次吸收峰。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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