Jeanne Paulette Bickford;Oliver D. Patterson;Delphine Le Cunff;Ralf Buengener;Stefan Radloff;Paul Werbaneth
{"title":"Guest Editorial Special Section on the 2022 SEMI Advanced Semiconductor Manufacturing Conference","authors":"Jeanne Paulette Bickford;Oliver D. Patterson;Delphine Le Cunff;Ralf Buengener;Stefan Radloff;Paul Werbaneth","doi":"10.1109/TSM.2023.3297059","DOIUrl":null,"url":null,"abstract":"The 2022 ASMC, our 33rd, returned to Saratoga Springs, NY as an in-person conference after 2 years as a virtual conference. While we are all grateful for the digital world’s enhancements that allowed this conference to be held remotely, attendees were happy to return to an in-person event where networking is much easier.","PeriodicalId":451,"journal":{"name":"IEEE Transactions on Semiconductor Manufacturing","volume":"36 3","pages":"307-310"},"PeriodicalIF":2.3000,"publicationDate":"2023-08-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/iel7/66/10209215/10209219.pdf","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Semiconductor Manufacturing","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10209219/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
The 2022 ASMC, our 33rd, returned to Saratoga Springs, NY as an in-person conference after 2 years as a virtual conference. While we are all grateful for the digital world’s enhancements that allowed this conference to be held remotely, attendees were happy to return to an in-person event where networking is much easier.
期刊介绍:
The IEEE Transactions on Semiconductor Manufacturing addresses the challenging problems of manufacturing complex microelectronic components, especially very large scale integrated circuits (VLSI). Manufacturing these products requires precision micropatterning, precise control of materials properties, ultraclean work environments, and complex interactions of chemical, physical, electrical and mechanical processes.