{"title":"Method for the Characterization of Extreme-Ultraviolet Photoresist Outgassing.","authors":"Charles Tarrio","doi":"10.6028/jres.114.011","DOIUrl":null,"url":null,"abstract":"<p><p>Outgassing from photoresists illuminated by extreme ultraviolet radiation can lead to degradation of the very expensive multilayer-coated optics in an extreme ultraviolet stepper. Reliable quantification of the various organic molecules outgassed by photoresists has been a challenging goal. We have designed a compact system for this measurement. In the first step, the total number of molecules emitted by the photoresist is measured using a pressure-rise method in a closed vacuum chamber, with the pressure measured by mechanical means using a capacitance displacement gauge. To provide identification and relative abundances, the outgassed molecules are then collected in an evacuated trap cooled by liquid nitrogen for subsequent analysis by gas chromatography with mass spectrometry. We will discuss the design and performance of the system.</p>","PeriodicalId":17039,"journal":{"name":"Journal of Research of the National Institute of Standards and Technology","volume":null,"pages":null},"PeriodicalIF":1.5000,"publicationDate":"2009-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4646569/pdf/","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Research of the National Institute of Standards and Technology","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.6028/jres.114.011","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2009/5/1 0:00:00","PubModel":"Print","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
Abstract
Outgassing from photoresists illuminated by extreme ultraviolet radiation can lead to degradation of the very expensive multilayer-coated optics in an extreme ultraviolet stepper. Reliable quantification of the various organic molecules outgassed by photoresists has been a challenging goal. We have designed a compact system for this measurement. In the first step, the total number of molecules emitted by the photoresist is measured using a pressure-rise method in a closed vacuum chamber, with the pressure measured by mechanical means using a capacitance displacement gauge. To provide identification and relative abundances, the outgassed molecules are then collected in an evacuated trap cooled by liquid nitrogen for subsequent analysis by gas chromatography with mass spectrometry. We will discuss the design and performance of the system.
期刊介绍：
The Journal of Research of the National Institute of Standards and Technology is the flagship publication of the National Institute of Standards and Technology. It has been published under various titles and forms since 1904, with its roots as Scientific Papers issued as the Bulletin of the Bureau of Standards.
In 1928, the Scientific Papers were combined with Technologic Papers, which reported results of investigations of material and methods of testing. This new publication was titled the Bureau of Standards Journal of Research.
The Journal of Research of NIST reports NIST research and development in metrology and related fields of physical science, engineering, applied mathematics, statistics, biotechnology, information technology.
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