Correlation between annealing conditions, microstructure, and photoelectrochemical activity of electrodeposited WO₃ thin films

IF 2.4 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Thin Solid Films Pub Date : 2026-10-15 Epub Date: 2026-10-12 DOI:10.1016/j.tsf.2026.141050
Ece Değirmenci, Gamze Atak
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引用次数: 0

Abstract

Among various photoanodes, tungsten oxide (WO₃) stands out due to its visible light absorption, long hole diffusion length, and chemical stability in acidic electrolytes. In this study, WO₃ thin films were fabricated onto FTO substrates by using pulsed voltage electrodeposition (PVE). The structural (XRD), morphological and compositional (SEM–EDX), optical (UV–Vis), electronic (Mott–Schottky), surface-chemical (XPS), and LSV measurements were analyzed in detail to understand their PEC properties. A two-stage thermal optimization was then applied to establish an efficient photoanode protocol. In the first stage, the annealing temperature was varied from 250 °C to 400 °C for 2 h. Characterization results showed that 300 °C is a critical crystallization threshold. Below this point, films remain amorphous with negligible photocurrent. Above it, excessive grain growth reduces the active surface area. Specifically, pore density decreased from 22.3 % at 250 °C to 3.82 % at 400 °C. In the second stage, annealing durations between 0.5 and 6 h were tested at 300 °C. Crystallization effectively began after 2 h of annealing. Across the investigated range, average crystallite size increased from 1.22 nm to 18.9 nm. A 4-hour treatment yielded the highest photocurrent density. This sample also showed a donor density of 7.17 × 10¹⁹ cm⁻³ and the optimal Fermi level alignment (Ec−Ef = 0.00679 eV). In contrast, 6 h of annealing induced structural overdevelopment and grain boundary defects, reducing the photocurrent. At 300 °C, an annealing time of 2 h marked the onset of effective crystallization, while 4 h yielded the highest photocurrent density, identifying this condition as the optimal protocol for electrodeposited WO₃ photoanodes. This condition balances crystallinity, morphology, and charge carrier dynamics. XPS further confirmed that oxygen vacancies are the main donors in the films, and the optimized 4 h film sustained a stable photocurrent over 5 h of continuous illumination. The optimized films provide a reproducible baseline for next-generation development. Furthermore, they serve as a foundation for heterojunction architectures. Coupling WO₃ with complementary semiconductors is expected to further suppress recombination and extend light harvesting for efficient hydrogen production.
电沉积WO₃薄膜的退火条件、微观结构和光电化学活性之间的关系
在各种光阳极中,氧化钨(WO₃)因其可见光吸收、长孔扩散长度和酸性电解质中的化学稳定性而脱颖而出。在这项研究中,利用脉冲电压电沉积(PVE)在FTO衬底上制备了WO₃薄膜。详细分析了结构(XRD)、形貌和成分(SEM-EDX)、光学(UV-Vis)、电子(Mott-Schottky)、表面化学(XPS)和LSV测量结果,以了解它们的PEC性能。然后应用两阶段热优化来建立一个高效的光阳极协议。在第一阶段,退火温度在250 °C到400 °C之间变化2 h,表征结果表明300 °C是临界结晶阈值。低于这个点,薄膜保持无定形,光电流可以忽略不计。在此之上,过度的晶粒生长减少了有效表面积。具体来说,孔隙密度从250 °C时的22.3% %下降到400 °C时的3.82 %。在第二阶段,在300 °C下测试0.5至6 h的退火时间。退火2h后开始有效结晶。在整个研究范围内,平均晶粒尺寸从1.22 nm增加到18.9 nm。处理4小时产生最高的光电流密度。该样品的供体密度为7.17 × 10¹⁹cm⁻³,最佳费米能级排列(Ec−Ef = 0.00679 eV)。相比之下,6 h的退火会导致结构过度发育和晶界缺陷,从而降低光电流。在300 °C下,退火时间为2 h标志着有效结晶的开始,而4 h产生最高的光电流密度,确定该条件是电沉积WO₃光阳极的最佳方案。这个条件平衡了结晶度、形态和载流子动力学。XPS进一步证实了氧空位是薄膜中的主要供体,优化后的4 h薄膜在5 h以上的连续光照下具有稳定的光电流。优化后的薄膜为下一代开发提供了可重复的基线。此外,它们作为异质结架构的基础。WO₃与互补半导体的耦合有望进一步抑制复合,并延长光收集时间,以实现高效制氢。
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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