{"title":"Correlation between annealing conditions, microstructure, and photoelectrochemical activity of electrodeposited WO₃ thin films","authors":"Ece Değirmenci, Gamze Atak","doi":"10.1016/j.tsf.2026.141050","DOIUrl":null,"url":null,"abstract":"<div><div>Among various photoanodes, tungsten oxide (WO₃) stands out due to its visible light absorption, long hole diffusion length, and chemical stability in acidic electrolytes. In this study, WO₃ thin films were fabricated onto FTO substrates by using pulsed voltage electrodeposition (PVE). The structural (XRD), morphological and compositional (SEM–EDX), optical (UV–Vis), electronic (Mott–Schottky), surface-chemical (XPS), and LSV measurements were analyzed in detail to understand their PEC properties. A two-stage thermal optimization was then applied to establish an efficient photoanode protocol. In the first stage, the annealing temperature was varied from 250 °C to 400 °C for 2 h. Characterization results showed that 300 °C is a critical crystallization threshold. Below this point, films remain amorphous with negligible photocurrent. Above it, excessive grain growth reduces the active surface area. Specifically, pore density decreased from 22.3 % at 250 °C to 3.82 % at 400 °C. In the second stage, annealing durations between 0.5 and 6 h were tested at 300 °C. Crystallization effectively began after 2 h of annealing. Across the investigated range, average crystallite size increased from 1.22 nm to 18.9 nm. A 4-hour treatment yielded the highest photocurrent density. This sample also showed a donor density of 7.17 × 10¹⁹ cm⁻³ and the optimal Fermi level alignment (E<sub>c</sub>−E<sub>f</sub> = 0.00679 eV). In contrast, 6 h of annealing induced structural overdevelopment and grain boundary defects, reducing the photocurrent. At 300 °C, an annealing time of 2 h marked the onset of effective crystallization, while 4 h yielded the highest photocurrent density, identifying this condition as the optimal protocol for electrodeposited WO₃ photoanodes. This condition balances crystallinity, morphology, and charge carrier dynamics. XPS further confirmed that oxygen vacancies are the main donors in the films, and the optimized 4 h film sustained a stable photocurrent over 5 h of continuous illumination. The optimized films provide a reproducible baseline for next-generation development. Furthermore, they serve as a foundation for heterojunction architectures. Coupling WO₃ with complementary semiconductors is expected to further suppress recombination and extend light harvesting for efficient hydrogen production.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"852 ","pages":"Article 141050"},"PeriodicalIF":2.4000,"publicationDate":"2026-10-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Solid Films","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0040609026001975","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2026/10/12 0:00:00","PubModel":"Epub","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0
Abstract
Among various photoanodes, tungsten oxide (WO₃) stands out due to its visible light absorption, long hole diffusion length, and chemical stability in acidic electrolytes. In this study, WO₃ thin films were fabricated onto FTO substrates by using pulsed voltage electrodeposition (PVE). The structural (XRD), morphological and compositional (SEM–EDX), optical (UV–Vis), electronic (Mott–Schottky), surface-chemical (XPS), and LSV measurements were analyzed in detail to understand their PEC properties. A two-stage thermal optimization was then applied to establish an efficient photoanode protocol. In the first stage, the annealing temperature was varied from 250 °C to 400 °C for 2 h. Characterization results showed that 300 °C is a critical crystallization threshold. Below this point, films remain amorphous with negligible photocurrent. Above it, excessive grain growth reduces the active surface area. Specifically, pore density decreased from 22.3 % at 250 °C to 3.82 % at 400 °C. In the second stage, annealing durations between 0.5 and 6 h were tested at 300 °C. Crystallization effectively began after 2 h of annealing. Across the investigated range, average crystallite size increased from 1.22 nm to 18.9 nm. A 4-hour treatment yielded the highest photocurrent density. This sample also showed a donor density of 7.17 × 10¹⁹ cm⁻³ and the optimal Fermi level alignment (Ec−Ef = 0.00679 eV). In contrast, 6 h of annealing induced structural overdevelopment and grain boundary defects, reducing the photocurrent. At 300 °C, an annealing time of 2 h marked the onset of effective crystallization, while 4 h yielded the highest photocurrent density, identifying this condition as the optimal protocol for electrodeposited WO₃ photoanodes. This condition balances crystallinity, morphology, and charge carrier dynamics. XPS further confirmed that oxygen vacancies are the main donors in the films, and the optimized 4 h film sustained a stable photocurrent over 5 h of continuous illumination. The optimized films provide a reproducible baseline for next-generation development. Furthermore, they serve as a foundation for heterojunction architectures. Coupling WO₃ with complementary semiconductors is expected to further suppress recombination and extend light harvesting for efficient hydrogen production.
期刊介绍:
Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.