Effect of Annealing Temperature on the Sheet Resistance and Secondary Electron Emission Yield of Chromium Oxide-Coated Alumina

IF 1.6 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
IEEE Transactions on Plasma Science Pub Date : 2026-10-01 Epub Date: 2026-08-18 DOI:10.1109/TPS.2026.3722511
Akio Ogura;Souichi Katagiri;Ryu Hasunuma
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引用次数: 0

Abstract

A flashover along the surface of a solid insulator in vacuum is a discharge phenomenon that can result in device damage, and this issue limits, for example, the applicable maximum voltage of charged-particle accelerators. One effective approach to improve the withstand voltage of the insulator is to coat it with a slightly electrically conductive film. In this study, we evaluated the impact of the annealing temperature on the sheet resistance and the secondary electron emission yield (SEEY) of alumina substrates coated with an about 10-nm-thick chromium oxide film. To identify the origin of the observed trend in the SEEY data, we evaluated the oxidation state of the chromium atoms in the film by X-ray photoelectron spectroscopy (XPS), and we also measured the surface morphologies of chromium coatings on silicon prepared in the same way. The results indicate that the SEEY strongly depends on the grain size and the residual metallic chromium content.
退火温度对氧化铬包覆氧化铝片电阻和二次电子发射率的影响
真空中沿固体绝缘体表面的闪络是一种放电现象,可导致器件损坏,并且该问题限制了例如带电粒子加速器的适用最大电压。提高绝缘体耐电压的一种有效方法是在绝缘体上涂上一层微导电膜。在这项研究中,我们评估了退火温度对涂覆约10纳米厚氧化铬膜的氧化铝衬底的片电阻和二次电子发射率(SEEY)的影响。为了确定SEEY数据中观察到的趋势的来源,我们用x射线光电子能谱(XPS)评估了膜中铬原子的氧化状态,并测量了用相同方法制备的硅上的铬涂层的表面形貌。结果表明,合金表面粗糙度与晶粒尺寸和残余金属铬含量密切相关。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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