Design of Vacuum Interrupters for DC Circuit Breaker Topologies: A Comprehensive Review

IF 1.6 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2026-10-01 Epub Date: 2026-08-26 DOI:10.1109/TPS.2026.3723973

Verena West;Philipp Wienkamp;Simon Kimpeler;Willem Leterme

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引用次数: 0

Abstract

Medium-voltage (MV) and high-voltage (HV) direct-current (DC) circuit breakers, including current injection and hybrid DC circuit breakers (DCCBs), commonly use a mechanical breaker in the nominal current path to carry the load current and auxiliary circuits for the DC interruption. Vacuum interrupters (VIs) are investigated as the mechanical breaker, but their application in DCCBs presents new design challenges, because the requirements differ from alternating current (AC) interruption. This article presents a structured review of DCCB topologies that use VIs by analyzing reported operating conditions for the interrupter, to derive application-specific VI requirements. For active current injection (ACI) DCCBs, dielectric recovery under steep rate of rise of current (

$dI/dt$

) presents the key challenge, motivating VI designs promoting a fully diffuse arc. In natural-commutation hybrid DCCBs (HCBs) the interruption limit is in part determined by the current commutation. Therefore, controllable high arc voltage and coordination between dielectric recovery and blocking timing of the power electronics are dominant design levers for VIs in HCBs.

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用于直流断路器拓扑结构的真空断路设计：综述

中压（MV）和高压（HV）直流（DC）断路器，包括电流注入和混合直流断路器（DCCBs），通常在标称电流路径中使用机械断路器来承载负载电流和辅助电路进行直流中断。真空灭弧作为一种机械断路器进行了研究，但由于真空灭弧与交流灭弧的要求不同，在dccb中的应用提出了新的设计挑战。本文对DCCB拓扑进行了结构化的回顾，这些拓扑通过分析报告的中断器操作条件来使用VI，从而得出特定于应用程序的VI需求。对于主动注入电流（ACI） dccb来说，在电流急剧上升（$dI/dt$）的情况下，介质恢复是关键的挑战，激励VI设计促进完全扩散电弧。在自然换相混合dccb （hcb）中，中断限制部分由当前换相决定。因此，可控的高电弧电压以及电力电子器件介电恢复和阻断时序之间的协调是hcb中VIs的主要设计杠杆。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.