Electrostatic Analysis of Compact Modular High-Voltage Insulation Structures for High-Power RF Devices

IF 1.6 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
IEEE Transactions on Plasma Science Pub Date : 2026-10-01 Epub Date: 2026-09-03 DOI:10.1109/TPS.2026.3727925
D. Senthil Kumar;M. S. Shivabhagya;Sisir Kumar Nayak;Subrata Kumar Datta
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Abstract

High-voltage insulation structures are critical in interfacing high-power radio frequency (RF) devices with pulsed power sources (PPSs). These structures are intended to carry hundreds of kilovolts and tens of kiloamperes of pulsed power. They commonly suffer from breakdown during the operations due to the high electric stress encountered. In this study, we present an electrostatic analysis of a high-voltage structure in three different dielectric regions—transformer oil, solid insulator (nylon), and vacuum. Two types of structures, namely, nylon-based structure (structure-1) and alumina-based structure (structure-2), are analyzed. The geometries are modeled, simulated, and analyzed using ANSYS Maxwell 3-D in DC conditions. The objective of the study is to investigate the electric field distribution and identify the peak electric field value in each region of the structures. The structures which are studied in this article are generally used in integrating the high-power RF device with a pulsed power system. The peak electric field value and its location are critical in assessing breakdown risk. Fixed voltages of 400 and 600 kV are applied between the electrodes separated by dielectric material. Appropriate dielectric properties are selected for the regions to closely represent the practical conditions. Peak electric field value and its location are thoroughly checked with different mesh counts to minimize the numerical errors. The simulated results of the high-voltage structures are validated through experiments, and the structure successfully withstood the high-voltage pulse without dielectric breakdown. The simulation study is extended to a compact and modular alumina-based structure (structure-2) that serves as an ultrahigh vacuum (UHV) envelope as well as high-power devices.
大功率射频器件紧凑模块化高压绝缘结构的静电分析
高压绝缘结构是连接大功率射频器件与脉冲电源的关键。这些结构旨在承载数百千伏和数十千安的脉冲功率。在操作过程中,由于遇到的高电应力,它们通常会发生故障。在这项研究中,我们提出了高压结构在三个不同的介电区域-变压器油,固体绝缘体(尼龙)和真空中的静电分析。分析了两种结构,即尼龙基结构(结构1)和氧化铝基结构(结构2)。在直流条件下,使用ANSYS Maxwell 3d对几何形状进行建模、仿真和分析。研究的目的是研究电场分布,并确定结构各区域的峰值电场值。本文所研究的结构一般用于大功率射频器件与脉冲功率系统的集成。峰值电场值及其位置是评估击穿风险的关键。在由介电材料隔开的电极之间施加400和600千伏的固定电压。选取合适的介电性能,使各区域能较好地反映实际情况。用不同的网格数对峰值电场值及其位置进行了彻底的检查,以尽量减少数值误差。通过实验验证了高压结构的模拟结果,该结构成功地承受了高压脉冲而没有介质击穿。模拟研究扩展到一个紧凑和模块化的基于氧化铝的结构(结构-2),作为超高真空(UHV)包膜和大功率器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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